Custom Diffractometry and Fourier Ptychography Endstation
NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY
Original Solicitation Links
1333ND26QNB030236
]chips r&d custom diffractometry and fourier ptychography endstation
Contact
Submission Instructions
Description
The National Institute of Standards and Technology (NIST) is soliciting quotations for a custom diffractometry and Fourier ptychography endstation. This acquisition aims to enhance NIST's Nanoscale Device Characterization Division's capabilities in characterizing engineered materials and solid-state devices for information processing, sensing, and quantum technologies. The endstation will utilize extreme-ultraviolet (EUV) light for non-destructive, three-dimensional measurements of nanoscale features on computer chips, supporting the American semiconductor industry. The requirements include a custom vacuum chamber body capable of high vacuum, a sample stage with a wafer chuck for a 300mm silicon wafer, an optical/camera stage with a motorized vertical arc arm, and a full in-vacuum EUV camera with a 2kx2k pixel resolution or better. The system must meet stringent vacuum and geometric specifications, with all components being new and of high quality. Optional services include installation and training for up to two users, to be completed within two weeks of delivery and five days after installation, respectively.
Classification Codes
Smart Codes
Specifications
Documents
| Title | Date Posted |
|---|---|
| Statement of Work.docx | Jun 15, 2026 12:00 PM |
| Basic schematics for the vacuum chamber.pdf | Jun 16, 2026 12:00 PM |
| Solicitation_1333ND26QNB680229.docx | Jun 15, 2026 12:00 PM |
| Attachment 2- Applicable Provisions and Clauses.docx | Jun 15, 2026 12:00 PM |
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